Theris Nanotechnology, specialised in UHV Nanoparticle deposition equipment, is utilising gas condensation of size-selected Nanoparticles in vacuum to produce contaminant-free films. In the Theris NanoStreamS and NanoStreamT sources, the nanoparticles are produced by a ‘terminated gas condensation’ method. In this technique, a DC magnetron is used to sputter target material. The sputtered atoms enter the high pressure condensation zone where their mean free path becomes very small and they quickly thermalise. Nanoparticles are formed as these thermalised atoms migrate towards the expansion zone.
The Nanoparticles generated can be electrostatically manipulated either through deflection, focusing or acceleration which in effect produces a wide variety of coating morphologies from nanoparticle powder, through porous films with an exceptionally high surface area to crystalline structures. Nanoparticles can be generated with as few as 30 atoms up to those with diameters close to 20 nm.
The size of the nanoparticles generated by the Nanostream sources can be determined and further refined with the use of the optional MSF quadrupole mass filter specifically designed for high-mass particles. The MSF mass filter can be used in line with the NanoStream sources to analyse and further filter the nanoparticle beam.
NanoShell - Core Shell Coater: The NanoShell source enables the coating of nanoparticles created in our NanoStream sources with a second material, to create a core shall nanoparticle structure.
The NanoShell sits in between the NanoStream source and the deposition chamber, it uses retarding fields to increase the residence time of the particles in the coating chamber and thereby creating a core shell particle.
The Theris RF atom sources TAS30 & TAS60 are fully UHV compatible and designed for use in the most demanding applications. The coaxial RF coil is optimized for power transfer to the
plasma zone, with full coupling along the entire length of the coil, ensuring even dissociation and maximum atomic flux. The support components are also far removed from the coil, thus avoiding the possibility of accidental contact with the RF coil as is more common in other designs.
The discharge zone made from high quality materials only. Users can define the optimum gas flow by selecting from a range of different end-plates - which can be further customized if desired. The source also incorporates a zero-ion current configuration as standard, using deflection plates to push any residual ions out of the beam.
Custom Systems for Nanoparticle Deposition
Theris not only offer UHV deposition components, but can also offer the full system configuration. Ensuring that your equipment is tailored precisely to your needs.
